SERS performance of GaN/Ag substrates fabricated by Ag coating of GaN platforms

• Magdalena A. Zając,
• Bogusław Budner,
• Malwina Liszewska,
• Bartosz Bartosewicz,
• Łukasz Gutowski,
• Jan L. Weyher and
• Bartłomiej J. Jankiewicz

Beilstein J. Nanotechnol. 2023, 14, 552–564, doi:10.3762/bjnano.14.46

• relative to the axis of the pillars. The observed effect can be associated with the initial orientation of GaN pillars to the plasma plume (Figure 1); pillars are under some angle to the plasma plume. This effect is similar to the one observed during the growth of thin metal films in oblique angle

• deposition [39]. However, in the case described herein, other parameters of the PLD process also influence the observed results. This way of growing the Ag layer on the pillars results in a thickness disproportion between the base and the top of the pillars, along with an increase in the amount of deposited

Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering

• Hamidreza Hajihoseini,
• Movaffaq Kateb,
• Snorri Þorgeir Ingvarsson and
• Jon Tomas Gudmundsson

Beilstein J. Nanotechnol. 2019, 10, 1914–1921, doi:10.3762/bjnano.10.186

• -100 44, Stockholm, Sweden 10.3762/bjnano.10.186 Abstract Background: Oblique angle deposition is known for yielding the growth of columnar grains that are tilted in the direction of the deposition flux. Using this technique combined with high-power impulse magnetron sputtering (HiPIMS) can induce

• suppress the inclined columnar growth induced by oblique angle deposition. Thus, the ferromagnetic thin films obliquely deposited by HiPIMS deposition exhibit different magnetic properties than dcMS-deposited films. The results demonstrate the potential of the HiPIMS process to tailor the material

• properties for some important technological applications in addition to the ability to fill high aspect ratio trenches and coating on cutting tools with complex geometries. Keywords: glancing angle deposition (GLAD); high-power impulse magnetron sputtering (HiPIMS); oblique angle deposition; magnetron

Quantification and coupling of the electromagnetic and chemical contributions in surface-enhanced Raman scattering

• Yarong Su,
• Yuanzhen Shi,
• Ping Wang,
• Jinglei Du,
• Markus B. Raschke and
• Lin Pang

Beilstein J. Nanotechnol. 2019, 10, 549–556, doi:10.3762/bjnano.10.56

• lithography (IL) and oblique angle deposition (OAD) methods [23]. The Ag substrates with nanostructures are gratings with and without nanogap, which can achieve field enhancements as high as 106. The samples were pre-characterized by AFM (see example of Ag grating with nanogap in inset in Figure 1a, for

Comparative study of sculptured metallic thin films deposited by oblique angle deposition at different temperatures

• Susann Liedtke,
• Christoph Grüner,
• Jürgen W. Gerlach and
• Bernd Rauschenbach

Beilstein J. Nanotechnol. 2018, 9, 954–962, doi:10.3762/bjnano.9.89

• substrate temperature is found for those films. Keywords: biaxial texture; metallic tilted columns; oblique angle deposition; porosity; shadowing; thin films; Introduction The ability to produce highly porous metallic thin films is a substantial issue for a large number of applications [1]. For instance

• cells [4][5][6] or Li-ion batteries [7][8]. Oblique angle deposition (OAD) [9][10][11] opens the opportunity to grow such films in an elegant and easy to handle way. During the OAD process, the substrate is tilted to an oblique incidence angle θ between incoming particle flux and normal of the substrate

• growth of tilted Al columns. Recently, it was demonstrated that metal columns (such as Ti and Cr) grown by oblique angle deposition have a crystalline structure at 300 K [16]. In the present study, this result can be confirmed for the metal Al grown by OAD at 77 K and 300 K. In-plane pole figure

Au nanostructure fabrication by pulsed laser deposition in open air: Influence of the deposition geometry

• Rumen G. Nikov,
• Anna Og. Dikovska,
• Nikolay N. Nedyalkov,
• Georgi V. Avdeev and
• Petar A. Atanasov

Beilstein J. Nanotechnol. 2017, 8, 2438–2445, doi:10.3762/bjnano.8.242

• ][15][16]. Over the years, the realization of the PLD set up in oblique angle deposition (OAD) geometry has also been developed [16]. It has been demonstrated that a variety of structures arranged as nanocolumns with different sizes and densities could be produced by application of this specific

• thickness. Furthermore, the realization of the PLD setup in an oblique angle deposition geometry additionally complicates the correct measurement of sample thickness. The shadowing effect and competition between the nanocolumns during the growth leads to the fabrication of nanocolumns of different height

Nanotopographical control of surfaces using chemical vapor deposition processes

• Meike Koenig and
• Joerg Lahann

Beilstein J. Nanotechnol. 2017, 8, 1250–1256, doi:10.3762/bjnano.8.126

• energy of the underlying substrate using a fluorinated polymer. Minimal nucleation of monomer was found on the fluorinated spots, which led to a dense polymer coating on these sites. These techniques show great promise in the fabrication of membranes [37]. Oblique angle deposition A significant amount of

• ° to the substrate plane results in the formation of slanted nanocolumns via a self-shadowing mechanism with a diameter of around 150 nm [39][40][41]. The slanting angle can be controlled via the deposition angle. Compared to inorganic oblique angle deposition, more complex algorithms have to be

Electromagnetic enhancement of ordered silver nanorod arrays evaluated by discrete dipole approximation

• Guoke Wei,
• Jinliang Wang and
• Yu Chen

Beilstein J. Nanotechnol. 2015, 6, 686–696, doi:10.3762/bjnano.6.69

• ]. Among them, aligned Ag nanorod (AgNR) arrays fabricated by oblique angle deposition (OAD) were shown to be promising SERS substrates with enhancement factors of approximately 108 [12][13][14][15]. However, the uniformity and reproducibility of SERS substrates remains a major challenge for the